indiaBUILD

Deep trench etching (RIE/reactive ion etch for 30nm-2µm trenches)

Deep trench etching (RIE/reactive ion etch for 30nm-2µm trenches)
India's statusProducing
Criticalitycritical
Typeprocess
SectorSemiconductors
VerificationUnverified
Revised2026-07-15

Tech tree

read left to right · click any card for its record
Deep trench etching (RIE/reactive ion etch for 30nm-2µm trenches)
Producing · this record
What it unlocks
DRAM capacitor cell architecture
No capability

Full analysis queued.